Titanium Sputtering Targets can be used for flat display coating, ornamental coating and semiconductor components. This is why it's one of the key materials used in the preparation of integrated circuits.

High Purity Titanium Suttering Target for Metal Alloy:
Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Properties:
Titanium sputtering targets are made from titanium metal. This is a strong and lightweight material that is well-respected for its strength-to-weight ratio. Titanium metal, a heavy metal that has low density is very ductile. This is especially true in oxygen-free areas. Because it has a high melting temperature (more than 1,650 degrees Celsius or 3,000 degrees Fahrenheit), this metal is useful for refractory purposes. Paramagnetic with low thermal conductivity and electrical power,

Application:
This is a popular choice for flat panel and flat panel application, as well as integrated circuits and DRAMS.

Payments & Transport:

Steel Alloy High Purity Ti Titanium Sputtering Target Property
Other Titles	The Titanium sputtering goal
	N/A
Compound Formula	Ti
Molecular Weight	N/A
Appearance	N/A
Melting Point	N/A
Solubility In Water	N/A
Density	N/A
Purity	99.6%
Size	Individualized
Boling Point	N/A
Specific Heat	N/A
Thermo Conductivity	N/A
Thermal Expansion	N/A
Young's Module	N/A
Exact	N/A
Monoisotopic	N/A
Steel Alloy Titanium Sputtering High Purity Target Health & Safety Information
Safety Notice	N/A
Hazard Statements	N/A
Flashing Point	N/A
Hazard Codes	N/A
Risk Codes	N/A
Safety statements	N/A
RTECS #	N/A
Transport Information	N/A
WGK Germany	N/A

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